At the Design Automation Conference (DAC), June 21-25 in New Orleans, visitors to NumeriTech's booth (NO. 3057) will be introduced to the Subwavelenth N-abled Process, a phase-shifting technology infrastructure that enables semiconductor manufacturing companies to deliver sub-0.12 micron IC feature sizes using existing process equipment.
Visitors will also be able to see the first public demonstration of the iN-Phase product line, the electronics industry's only commercial design tool that automatically phase-shifts subwavelength IC designs. iN-Phase, when integrated into an N-abled process, enables electronics companies to substantially increase IC performance in typically two weeks or less, rather than going through a redesign of several months. Demonstrations will show a microprocessor design both before and after the application of phase-shifting, and show how phase-shifting improved the design's performance, power, and gate length.
Also at DAC, Buno Pati, Numeritech's co-founder, president and CEO, will present "Sub-wavelength lithography and its potential impact on design and EDA," a tutorial embedded in Session 45. During "Subwavelength Lithography: How will it impact your design flow?" Dr. Pati and panel members from Cadence, KLA-Tencor, Motorola, IBM, and Synopsys will then debate the design implications arising from techniques used to control subwavelength lithography. The panel discussion will be held on Thursday, June 24, from 10:30 a.m. to 12:30 p.m.
NumeriTech will host a "Winner's Circle" late-night break at the Hilton Riverside Inn on Tuesday, June 22, from 11:00 p.m. to 1:00 a.m. Friends and DAC visitors are invited to stop by for dessert, coffee, cold drinks, and a foot massage. Interested party-goers are asked to RSVP to firstname.lastname@example.org.